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电子探针能谱测定膜厚的E_f理论
引用本文:秦会斌,杨永德,于虹.电子探针能谱测定膜厚的E_f理论[J].浙江大学学报(农业与生命科学版),1998(Z1).
作者姓名:秦会斌  杨永德  于虹
作者单位:杭州电子工业学院信息材料与器件实验室,电子部52所
摘    要:研究利用电子探针能谱(EDS)检测薄膜厚度的技术。该技术的核心是:①确定特征x射线的临界激发能Ef;②确定所采用的半经验公式。Ef方法是一种很好的估测膜厚的近似方法,具有很好的实用价值。文中还探讨了二种确定薄膜Ef的方法。

关 键 词:薄膜  厚度  测量  EDS

Theory of thickness determination of thin films by EDS Journal of Zhejiang Agricultural University
Qin Huibin , Yang Yongde , Yu Hong.Theory of thickness determination of thin films by EDS Journal of Zhejiang Agricultural University[J].Journal of Zhejiang University(Agriculture & Life Sciences),1998(Z1).
Authors:Qin Huibin  Yang Yongde  Yu Hong
Institution:Qin Huibin 1, Yang Yongde 1, Yu Hong 2
Abstract:The theory of the thickness determination of thin films by EDS was studied There are two key points One is the determination of critical exciting energy E f of character X ray Another is the determination of the semiexpirical formula for the thickness The method has an advantage over other methods and it possesses the practicability Two methods for determinating E f were discussed also
Keywords:film  thickness  measurement  EDS  
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