| Method of Measuring the Thickness of Nano-scale Thin Film |
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| 作者姓名： | YU Jiang-tao LI Ming-wei WANG Xiao-ding CHENG Ming |
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| 作者单位： | 1. College of Power Engineering; 2. Research Center of Biological Function Information and Instruments of Chongqing University Supported by Second-Term National 985 Project, Chongqing University, Chongqing 400030,China |
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| 摘 要： | A method is proposed to measure the thickness of nano-scale thin film. Based on the differences about mechanical property between the film and the base, a required scratching will be obtained with the proper tool scratching the film directly, which is through the film touching the base and without any effects to the surface of the base. Scanning the scratching area by using atomic force microscope, some data will be obtained and the average thickness of nano-scale thin film can be calculated in the scratching area. The thickness of the TiO2 nano-scale thin film was measured by this method, the experiment result showed that the average thickness of the film is 71.6 nm, which is consistent with the reported result of the reference. This method has high measuring precision, wider application area, more intuitive images, simpler calculation and operation.
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| 关 键 词： | the thickness of nano-scale thin film atomic force microscope scratching measure |
| 修稿时间： | 2007/5/28 0:00:00 |
Method of Measuring the Thickness of Nano-scale Thin Film |
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| YU Jiang-tao,LI Ming-wei,WANG Xiao-ding,CHENG Ming.Method of Measuring the Thickness of Nano-scale Thin Film[J].Storage & Process,2007(6):35-38. |
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| Authors: | YU Jiang-tao LI Ming-wei WANG Xiao-ding CHENG Ming |
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| Institution: | 1. College of Power Engineering; 2. Research Center of Biological Function Information and Instruments of Chongqing University Supported by Second-Term National 985 Project, Chongqing University, Chongqing 400030,China |
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| Abstract: | A method is proposed to measure the thickness of nano-scale thin film. Based on the differences about mechanical property between the film and the base, a required scratching will be obtained with the proper tool scratching the film directly, which is through the film touching the base and without any effects to the surface of the base. Scanning the scratching area by using atomic force microscope, some data will be obtained and the average thickness of nano-scale thin film can be calculated in the scratching area. The thickness of the TiO2 nano-scale thin film was measured by this method, the experiment result showed that the average thickness of the film is 71.6 nm, which is consistent with the reported result of the reference. This method has high measuring precision, wider application area, more intuitive images, simpler calculation and operation. |
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| Keywords: | the thickness of nano-scale thin film atomic force microscope scratching measure |
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