首页 | 本学科首页   官方微博 | 高级检索  
     检索      

N离子注入对辣椒生长特性的影响
引用本文:蔡长龙,梁海锋,马睿,严一心.N离子注入对辣椒生长特性的影响[J].长江蔬菜,2012(20):28-31.
作者姓名:蔡长龙  梁海锋  马睿  严一心
作者单位:西安工业大学离子束生物工程与生物多样性研究中心,710032
基金项目:陕西省教育厅专项科研计划项目(12JK0838),陕西省科学技术研究发展计划项目(2012K08-05)
摘    要:采用生物改性离子注入设备对辣椒干种子进行了N+离子注入,研究了N+离子注入工艺参数及其对辣椒种子出苗时间、生长特性的影响.试验结果表明,离子注入能量和注入剂量是影响辣椒种子出苗时间的重要工艺参数,并且对辣椒后期的生长特性如茎高、叶片大小及外形有重要影响,另外,研究获得了使辣椒产生变异的基本工艺参数及其变化规律.

关 键 词:N+离子注入  辣椒  出苗时间  生长特性

Research on Growth Characteristics of Pepper after N+ Implantation
CAI Changlong,LIANG Haifeng,MA Rui,YAN Yixin.Research on Growth Characteristics of Pepper after N+ Implantation[J].Journal of Changjiang Vegetables,2012(20):28-31.
Authors:CAI Changlong  LIANG Haifeng  MA Rui  YAN Yixin
Institution:(Research Center of Ion Beam Bio-engineering and Biodiversity, Xi'an Technological University, Shaanxi 710032)
Abstract:In this paper, we implanted N+ into the dry seeds of pepper using the biological modified ion implantation equipment, and studied the suitable ion implantation process parameters and their effects on the emergence time and growth characteristics of dry pepper seeds. The results showed that, the ion implantation energy and dose were the important technical parameters influencing the germination time, and had important effects on the later growth characteristics, such as the stem height, leaf size and leave shape. We obtained the basic process parameters and change rules to get pepper mutants after N+ was implantated.
Keywords:Ion implantation  Pepper  Germination time  Growth characteristics
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《长江蔬菜》浏览原始摘要信息
点击此处可从《长江蔬菜》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号