| 氮离子注入对番茄种子损伤研究初报 |
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| 引用本文： | 聂凡,刘才宇.氮离子注入对番茄种子损伤研究初报[J].安徽农业科学,1991(3):280-282. |
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| 作者姓名： | 聂凡 刘才宇 |
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| 作者单位： | 安徽省农科院园艺研究所
(聂凡，刘才宇)，安徽省农科院园艺研究所(陈静娴) |
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| 摘 要： | 离子注入和伴随离子注入的其他物理效应都能影响番茄种子的电导率和发芽率.电导率和发芽率之间有一定相关性,两者都能反映种子的损伤.
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| 关 键 词： | 离子注入 番茄 电导率 发芽率 |
Primary study of tomato seeds damaged by N ion implantation |
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| Nie Fan,Liu Caiyu,Chen JingXian.Primary study of tomato seeds damaged by N ion implantation[J].Journal of Anhui Agricultural Sciences,1991(3):280-282. |
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| Authors: | Nie Fan Liu Caiyu Chen JingXian |
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| Institution: | Nie Fan;Liu Caiyu;Chen JingXian |
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| Abstract: | Ion implantation and its accompanying physical effects can affect theelectrical conductivity and the germinatien percentage of tomato seed. Both of themcan reflect the seed damage, because certain correlativity with electrical conduc-tivity and germination percentage have proved. |
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| Keywords: | Ion implantation Tomato Electrical conductivity Germination percentage |
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